Ambient Photochemical Pollution Monitoring System

Ambient photochemical pollution monitoring system is equipped with core monitoring system such as online photochemical precursors and photolysis rates to achieve comprehensive monitoring of ozone pollution; combines the comprehensive data analysis platform to determine the situation in the ozone pollution control area, and analyze the source of VOCs; helps relevant departments to achieve continuous improvement of air quality by finely controlling ozone and VOCs emission monitoring···

Our Comprehensive Ambient Photochemical Pollution Monitoring System Solutions

Our solutions monitor precursors, photolysis rates, and products for ozone formation analysis.

The ambient photochemical pollution monitoring system consists of two parts: application analysis platform and data collection platform.

Application Analysis Platform

The platform will finally determine the emission control area based on the monitored data, generate an O3 contribution rate chart, analyze the potential of ozone formation, analyze the VOC source resolution and pollutant characteristics.

Data Collection Platform

Photochemical Precursor Monitoring:

VOC-100: Consists of a low carbon (C2-C5) analyzer and a high carbon (C6-C12) analyzer, with FID & PID dual detectors to measure photochemical precursors from C2-C12.
WAGA-100 Atmospheric Water-Soluble Ionic Component Online Analyzer: Can accurately measure various water-soluble ions (H+, NO3-) in the atmosphere.
AOMS-600 NOx Analyzer: Uses chemiluminescence to measure the level of NOx in the ambient to determine or predict the degree of light pollution.

Process Factor Monitoring:

The analyzer is receiving solar radiation by quartz probe and transferring the radiation to spectrum via optical quartz fiber; the spectrum data will be evaluated and compared with reference data with mathematical approach and gives photolytic rate.

Characteristic Product Monitoring:

AOMS-300 Atmospheric Ozone Analyzer: Uses UV technology to measure gas ozone content, providing data support for photochemical monitoring solution.
PAN Analyzer: PAN is a significant representative index of photochemical pollution; thus the system adopts GC-ECD principle to identify and quantify the presence of PAN in sample.

All-round Monitoring: Covers the whole process monitoring of photochemical precursors, photolysis rate and photochemical characteristic products; can meet the demands of the cause, mechanism and process analysis of photochemical pollution for research institutions and the Environmental Protection Agency.

Provide Highly Feasible Management and Control Solutions: Quantify local contributions to refine enterprise management and control.

Authoritative Analysis Method: Cooperate with Peking University to draw EKMA curve based on OBM model and RACM mechanism, which can accurately locate and efficiently reduce emissions; build VOCs online source analysis system based on the PMF model to identify the contribution rate of each industry.

Our Solution Process: From Evaluation to Continuous Improvement

Our methodical approach drives success

Evaluation

Assess photochemical precursors and O3 levels to identify pollution control gaps.

Customization

Configure VOC-100 and AOMS-600 for precursor monitoring, integrating EKMA/PMF platforms.

Implementation

Deploy network in 4-6 weeks with training, including NOx calibration and data modeling.

Improvement

Provide 24/7 remote diagnostics, algorithm updates, and 2-year warranty for 99% uptime.

Why Choose FPI as Your Ambient Photochemical Pollution Monitoring System Solutions Partner?

FPI empowers O3 control with precursor networks and EKMA/PMF for targeted emission reductions.

Precursor Network Coverage: VOC-100 dual detectors measure C2-C12 with ppb accuracy, capturing 95% photochemical species for O3 tracing.
Photolysis Rate Precision: Solar radiation analyzers compute rates with <5% error, supporting RACM mechanism validation.
Source Resolution Efficiency: PMF identifies 85% VOC contributions, enabling 25% faster emergency responses.
Collaborative Authority: Partnerships with Peking University deliver EKMA curves for 20% emission optimization.

Additional metrics: 20+ years in photochemical analytics, 95% customer satisfaction, equipped 120+ O3 networks globally, GC-ECD for PAN federal reference accuracy.